AFM on humic acid adsorption on mica

Citation
Ag. Liu et al., AFM on humic acid adsorption on mica, COLL SURF A, 174(1-2), 2000, pp. 245-252
Citations number
31
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
ISSN journal
09277757 → ACNP
Volume
174
Issue
1-2
Year of publication
2000
Pages
245 - 252
Database
ISI
SICI code
0927-7757(20001115)174:1-2<245:AOHAAO>2.0.ZU;2-D
Abstract
Atomic force microscopy (AFM) was used to measure the thickness of (purifie d) Aldrich humic acid (HA) molecular layers adsorbed on mica. It was found that the drying methods used in preparing a sample affect the configuration of HA molecules adsorbed on mica's surface and the overall shape of the ad sorbed HA layers. Adsorbed HA exhibited a more flexible configuration in fr eeze-dried samples than in air-dried samples. For the freeze-dried samples, results showed that 90% of HA islands have a height of 4.2-5.7 nm, while t he similar range of the air-dried samples is 3.1-3.7 nm. Based on results o f bearing and particle-size analyses, it is proposed that HA molecules adso rb at discrete sites to form monolayer islands at the mica/water interface. Assuming a cylindrical polyelectrolyte configuration for the HA molecules, their average diameter in solution is expected to fall within the freeze-d ried height range. (C) 2000 Elsevier Science B.V. All rights reserved.