Electrodeposition of PbO2 onto Au and Ti substrates

Citation
J. Lee et al., Electrodeposition of PbO2 onto Au and Ti substrates, ELECTROCH C, 2(9), 2000, pp. 646-652
Citations number
55
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHEMISTRY COMMUNICATIONS
ISSN journal
13882481 → ACNP
Volume
2
Issue
9
Year of publication
2000
Pages
646 - 652
Database
ISI
SICI code
1388-2481(200009)2:9<646:EOPOAA>2.0.ZU;2-R
Abstract
The electrodeposition of lead dioxide (PbO2) onto Au and Ti substrates was anodically executed at 65 degrees C and the electrochemical characteristics and the mechanism in the PbO2 films deposition were investigated by the us ing an in-situ electrochemical quartz crystal microbalance, cyclic voltammo gram, and chronoamperametry experiments. An X-ray diffractometer and scanni ng electron microscope were also used for investigation of the formed lead dioxide films onto both substrates. Considering the experimental and theore tical mass/charge ratios, PbO2 deposition on Au by applying constant potent ial was in excellent agreement with the theoretical value, while relatively higher values of the mass/charge ratio due to film hydration were found wh en Ti was used as substrate. Analysis of X-ray diffractometer and scanning electron microscope show different film structures on each substrate. espec ially the additional hydration of the lead dioxide film deposited on Ti lea ds to some structural effects, identified as Sky-Lotus PbO2. (C) 2000 Elsev ier Science S.A. All rights reserved.