New seed geometry for growth of low dislocation synthetic quartz

Citation
Ah. Shinohara et al., New seed geometry for growth of low dislocation synthetic quartz, IEEE ULTRAS, 47(5), 2000, pp. 1199-1203
Citations number
16
Categorie Soggetti
Optics & Acoustics
Journal title
IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL
ISSN journal
08853010 → ACNP
Volume
47
Issue
5
Year of publication
2000
Pages
1199 - 1203
Database
ISI
SICI code
0885-3010(200009)47:5<1199:NSGFGO>2.0.ZU;2-4
Abstract
A method to grow low dislocation density synthetic quartz by using a specia l cutting seed geometry is reported. With this method, a relatively high di slocation density seed material is allowable. For such a purpose, a seed of new geometry was prepared and grown in a standard hydrothermal growth cond ition, long in Y-direction with multiple V-shaped notches made on Z-face. T he characterization study was conducted by X-ray topography. The results showed new growth regions, equal to the numbers of V-shaped not ches made in the seed and usually not found in the conventional Y- and Z-ba r synthetic quartz crystals. Each new growth region is composed of two sect ors of distinct textures. Soon they disappear due to their high growth velo city, and they are replaced by the so-called Z-region. However, the growth process of these new sectors grown perpendicular to the internal faces of t he V-shaped notches played an important role in inhibiting the propagation of the dislocation originally present in the seed into the grown Z-region.