The effect of stress on the microwave dielectric properties of Ba0.5Sr0.5TiO3 thin films

Citation
Js. Horwitz et al., The effect of stress on the microwave dielectric properties of Ba0.5Sr0.5TiO3 thin films, J ELECTROCE, 4(2-3), 2000, pp. 357-363
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTROCERAMICS
ISSN journal
13853449 → ACNP
Volume
4
Issue
2-3
Year of publication
2000
Pages
357 - 363
Database
ISI
SICI code
1385-3449(200006)4:2-3<357:TEOSOT>2.0.ZU;2-N
Abstract
Single phase, (1 0 0) epitaxial Ba0.5Sr0.5TiO3 (BST) films have been deposi ted onto (1 0 0) LaAlO3 and MgO substrates by pulsed laser deposition (PLD) . The capacitance and dielectric losses of as-deposited and annealed films have been measured from 1-20 GHz as a function of electric field (0-80 kV/c m) at room temperature. The dielectric properties are strongly affected by the substrate type, post-deposition annealing time (less than or equal to 6 h) and temperature (less than or equal to 1200 degrees C). For epitaxial B ST films deposited onto MgO, it is observed that, after a post- deposition anneal the dielectric constant and the dielectric loss decreases. For epita xial BST films deposited onto LAO, a post-deposition anneal (less than or e qual to 1000 degrees C) results in an increase in the dielectric constant a nd an increase in the dielectric loss. The dc electric field induced change in the dielectric constant tends to increase with the dielectric constant and is largest for as-deposited films on MgO and post-deposited annealed fi lms on LAO. In general, for epitaxial BST films, a large electric field eff ect is observed in films that have a large dielectric loss and a small elec tric field effect in films that have a low dielectric loss. High resolution X-ray diffraction measurements indicate that deposited film exhibit a sign ificant tetragonal distortion which is strongly affected by a by a post dep osition anneal. The observed differences in dielectric properties of the ep itaxial BST films on MgO and LAO are attributed to the differences in film stress which arise as a consequence of the lattice mismatch between the fil m and the substrate and the differences in the thermal coefficient of expan sion between the film and the substrate. A thin amorphous buffer layer of B ST has been used to relieve stress induced by the lattice mismatch between the film and the substrate. Unlike epitaxial films, stress relieved films d o not show an inverse relationship between dielectric tuning and Q (1/tan d elta) and may be superior materials for tunable microwave devices.