Low-temperature oxygen migration and negative thermal expansion in ZrW2-xMoxO8

Citation
Jso. Evans et al., Low-temperature oxygen migration and negative thermal expansion in ZrW2-xMoxO8, J AM CHEM S, 122(36), 2000, pp. 8694-8699
Citations number
26
Categorie Soggetti
Chemistry & Analysis",Chemistry
Journal title
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
ISSN journal
00027863 → ACNP
Volume
122
Issue
36
Year of publication
2000
Pages
8694 - 8699
Database
ISI
SICI code
0002-7863(20000913)122:36<8694:LOMANT>2.0.ZU;2-K
Abstract
The ZrW2O8 family of materials has been shown to display the unusual proper ty of an isotropic bulk contraction in volume as a function of temperature. We report here on negative thermal expansion properties and oxygen migrati on at very low temperatures in ZrW2-xMoxO8 phases. ZrWMoO8 shows significan t negative thermal expansion (alpha(1) = -8.7 x 10(-6) K-1) and oxygen migr ation at temperatures as low as 200 K with an activation energy of 0.23 eV. We are unaware of oxygen migration at such low temperatures in other elect ronic insulators. The low-temperature migration is associated with an order -disorder transition between the a and beta forms of the material with Delt a V-disorder = -0.24%. A negative volume change for an order-disorder trans ition is unusual.