Machining characterization of the nano-lithography process using atomic force microscopy

Citation
Th. Fang et al., Machining characterization of the nano-lithography process using atomic force microscopy, NANOTECHNOL, 11(3), 2000, pp. 181-187
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
NANOTECHNOLOGY
ISSN journal
09574484 → ACNP
Volume
11
Issue
3
Year of publication
2000
Pages
181 - 187
Database
ISI
SICI code
0957-4484(200009)11:3<181:MCOTNP>2.0.ZU;2-9
Abstract
The machining characteristics of nano-lithography are studied using atomic force microscopy (AFM). Scribing (scratching) experiments containing recipr ocal single line furrows and multiple furrows are conducted to investigate the influence of the working parameters on the machined surface's propertie s, and upon the machining efficiency. The influence of the working paramete rs, including the applied load on the cantilever, scribing cycles, scribing speed and scribing feed, on the surface roughness, surface depth and mater ial removal rate can then be accessed. Results indicate that the applied lo ad is more significant than the scribing cycles on the groove depth. Howeve r, rougher surfaces are produced at larger loads. In multiple furrows produ ced with larger applied loads in order to obtain deeper furrows, surface ro ughness is improved by adjusting the scribing feed to a small value.