PECULIARITIES IN THE ELECTRON PROPERTIES OF DELTA(SB)-LAYERS IN EPITAXIAL SILICON .3. ELECTRON-PHONON RELAXATION

Citation
Vy. Kashirin et al., PECULIARITIES IN THE ELECTRON PROPERTIES OF DELTA(SB)-LAYERS IN EPITAXIAL SILICON .3. ELECTRON-PHONON RELAXATION, Low temperature physics, 23(4), 1997, pp. 303-307
Citations number
22
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
1063777X
Volume
23
Issue
4
Year of publication
1997
Pages
303 - 307
Database
ISI
SICI code
1063-777X(1997)23:4<303:PITEPO>2.0.ZU;2-D
Abstract
Complex studies of weak electron localization, electron-electron inter action, and electron overheating in Si crystals containing a delta(Sb) -layer with various concentrations of Sb atoms are carried out in orde r to obtain information on the characteristic times of inelastic elect ron relaxation. The temperature dependence of the electron-phonon rela xation time tau(ep) derived from the electron overheating effect can b e described by the dependence tau(ep) proportional to T-P, where p con gruent to 3.7 +/- 0.3, which corresponds to the case q(T)l < l (q(T) i s the wave vector of the thermal phonon and l the electron mean free p ath). (C) 1997 American Institute of Physics.