Leakage current in PZT films with sputtered RuOx electrodes

Citation
Cw. Law et al., Leakage current in PZT films with sputtered RuOx electrodes, SOL ST ELEC, 44(9), 2000, pp. 1569-1571
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
9
Year of publication
2000
Pages
1569 - 1571
Database
ISI
SICI code
0038-1101(200009)44:9<1569:LCIPFW>2.0.ZU;2-I
Abstract
We have studied the leakage current in sol-gel PZT capacitors with reactive sputtered RuOx electrodes under different oxygen pal tial pressures during sputtering. The amount of oxygen content in the electrodes has been found to have a significant effect on the leakage current. Considerable decrease of leakage current at lower electric field can he achieved by sputtering at a higher oxygen partial pressure of 20%. Correlation with degradation expe rimental results suggests that the presence of an oxygen deficient layer ne ar the electrode has crucial effect in controlling both the leakage current and degradation. (C) 2000 Elsevier Science Ltd. All rights reserved.