COBALT DOPING IN BATIO3 THIN-FILMS BY 2-TARGET PULSED KRF LASER-ABLATION WITH IN-SITU LASER ANNEALING

Cobalt doped BaTiO3 thin films have been fabricated using two-target p ulsed laser ablation with in situ laser annealing. KrF laser ablated s imultaneously both BaTiO3 and Co3O4 sintered targets and the cobalt co ncentration could simply be controlled at the concentration range of 0 .08%-5% by adjusting laser fluences, off-axis deposition angles, and l aser-irradiated area for Co ablation. All Co:BaTiO3 films were epitaxi ally grown on MgO(100) substrate. Optical absorption coefficients were measured at visible region of the spectrum with increasing Co dopant concentrations. (C) 1997 American Institute of Physics.