Silicon has been anodized such that the porous layer is passivated wit
h a homogeneous stretching phase by incorporating H2O2 in the anodizat
ion mixture. Fourier transform infrared spectroscopy measurements show
that the Si-H stretching mode oriented perpendicular to the surface a
t similar to 2100 cm(-1) dominates the spectrum with negligible contri
bution from the bending modes in the 600-900 cm(-1) region. Material a
nalysis using Auger electron spectroscopy shows that the samples have
very little impurities, and that the luminescent layer is very thin (5
-10 nm). Scanning electron microscopy shows that the surface is smooth
er with features smaller than those of conventional samples. (C) 1997
American Institute of Physics.