IDEAL ANODIZATION OF SILICON

Citation
Z. Yamani et al., IDEAL ANODIZATION OF SILICON, Applied physics letters, 70(25), 1997, pp. 3404-3406
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
70
Issue
25
Year of publication
1997
Pages
3404 - 3406
Database
ISI
SICI code
0003-6951(1997)70:25<3404:IAOS>2.0.ZU;2-1
Abstract
Silicon has been anodized such that the porous layer is passivated wit h a homogeneous stretching phase by incorporating H2O2 in the anodizat ion mixture. Fourier transform infrared spectroscopy measurements show that the Si-H stretching mode oriented perpendicular to the surface a t similar to 2100 cm(-1) dominates the spectrum with negligible contri bution from the bending modes in the 600-900 cm(-1) region. Material a nalysis using Auger electron spectroscopy shows that the samples have very little impurities, and that the luminescent layer is very thin (5 -10 nm). Scanning electron microscopy shows that the surface is smooth er with features smaller than those of conventional samples. (C) 1997 American Institute of Physics.