ABSOLUTE PHOTOYIELD FROM CHEMICAL-VAPOR-DEPOSITED DIAMOND AND DIAMOND-LIKE CARBON-FILMS IN THE UV

Authors
BRESKIN A CHECHIK R SHEFER E BACON D AVIGAL Y KALISH R LIFSHITZ Y
Citation
A. Breskin et al., ABSOLUTE PHOTOYIELD FROM CHEMICAL-VAPOR-DEPOSITED DIAMOND AND DIAMOND-LIKE CARBON-FILMS IN THE UV, Applied physics letters, 70(25), 1997, pp. 3446-3448
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
70
Issue
25
Year of publication
1997
Pages
3446 - 3448
Database
ISI
SICI code
0003-6951(1997)70:25<3446:APFCDA>2.0.ZU;2-1
Abstract
The absolute photoyields of chemical vapor deposited (CVD) diamond and amorphous hydrogen-free diamondlike carbon (DLC) films, in the range of 140-300 nm, are reported. CVD diamond films exhibit a large photoyi eld, of a few percent in the range 140-180 nm. DLC films have a 20-50 times lower yield. Post growth hydrogenation is found to substantially increase the photoyield of CVD diamond films. We discuss the applicab ility of these films as UV photocathodes coupled to electron multiplie rs based on gaseous charge multiplication. (C) 1997 American Institute of Physics.