Reactive deposition of conformal palladium films from supercritical carbondioxide solution

Citation
Jm. Blackburn et al., Reactive deposition of conformal palladium films from supercritical carbondioxide solution, CHEM MATER, 12(9), 2000, pp. 2625-2631
Citations number
28
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMISTRY OF MATERIALS
ISSN journal
08974756 → ACNP
Volume
12
Issue
9
Year of publication
2000
Pages
2625 - 2631
Database
ISI
SICI code
0897-4756(200009)12:9<2625:RDOCPF>2.0.ZU;2-1
Abstract
High-purity palladium films were deposited onto Si wafers and polyimide by the reduction of organopalladium compounds in supercritical CO2 solution us ing a batch process at temperatures between 40 and 80 degrees C and pressur es between 100 and 140 bar. Hydrogenolysis of pi-2-methylallyl(cyclopentadi enyl)palladium(II) in CO2 at 60 degrees C is complete in less than 2 min, y ielding continuous, 100-200 nm thick, reflective films and the benign, full y hydrogenated ligand decomposition products, cyclopentane and isobutane. A nalysis of the deposited films by X-ray photoelectron spectroscopy indicate s that they are free of ligand-derived contamination. Deposition of thin fi lms on patterned silicon wafers having feature sizes as small as 0.1 mu m w ide by 1.0 mu m deep is strictly conformal, including uniform coverage of t he lower corners and bottoms of the trenches. Deposition by hydrogenolysis of palladium(II) hexafluoroacetylacetonate also yields high-quality films w hile deposition using pi-allyl-(2,4-pentanedionato)palladium(II) is sensiti ve to fluid-phase decomposition of the precursor and yields nonuniform depo sits.