High-temperature oxidation of films based on aluminum nitride

Citation
Ra. Andrievskii et al., High-temperature oxidation of films based on aluminum nitride, DOKL PHYS C, 373(1-3), 2000, pp. 99-101
Citations number
9
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
DOKLADY PHYSICAL CHEMISTRY
ISSN journal
00125016 → ACNP
Volume
373
Issue
1-3
Year of publication
2000
Pages
99 - 101
Database
ISI
SICI code
0012-5016(200007)373:1-3<99:HOOFBO>2.0.ZU;2-R