Experimental determination of electron drift velocity in 4H-SiC p(+)-n-n(+) avalanche diodes

Citation
Kv. Vassilevski et al., Experimental determination of electron drift velocity in 4H-SiC p(+)-n-n(+) avalanche diodes, IEEE ELEC D, 21(10), 2000, pp. 485-487
Citations number
16
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
21
Issue
10
Year of publication
2000
Pages
485 - 487
Database
ISI
SICI code
0741-3106(200010)21:10<485:EDOEDV>2.0.ZU;2-5
Abstract
4H-SiC p(+)-n-n(+) diodes of low series resistivity (<1 x 10(-4) Omega.cm(2 )) were fabricated and packaged. The diodes exhibited homogeneous avalanche breakdown at voltages U-b =250-270 V according to the doping level of the n layer. The temperature coefficient of the breakdown voltage was measured to be 2.6 x 10(-4) K-1 in the temperature range 300 to 573 K. These diodes were capable to dissipate a pulsed power density of 3.7 MW/cm(2) under aval anche current conditions. The transient thermal resistance of the diode was measured to be 0.6 K/W for a 100-ns pulse width. An experimental determina tion of the electron saturated drift velocity along the c-axis in 4H-SiC wa s performed for the first time. It was estimated to be 0.8 x 10(7) cm/s at room temperature and 0.75 x 10(7) cm/s at approximately 460 K.