Incorporation of hydrogen has a strong effect on the characteristics of sil
icon devices. A fundamental understanding of the microscopic mechanisms is
required in order to monitor and control the behavior of hydrogen. First-pr
inciples calculations hare been instrumental in providing such understandin
g. We first outline the basic principles that govern the interaction betwee
n hydrogen and silicon, followed by an overview of recent first-principles
results for hydrogen interactions with silicon. We show that H-2 molecules
are far less inert than previously assumed. We then discuss results for mot
ion of hydrogen through the material, as relating to diffusion and defect f
ormation. We also discuss the enhanced stability of Si-D compared to Si-H b
onds, which mar provide a means of suppressing defect generation. We presen
t a microscopic mechanism for hydrogen-hydrogen exchange, and examine the m
etastable =SiH2 complex formed during the exchange process. Throughout, we
highlight issues relevant for hydrogen in amorphous silicon (used in solar
cells, sensors and displays) and in Si-SiO2 structures (used in integrated
circuits). The broader impact of first-principles calculations on computati
onal electronics will also be discussed.