This work shows how physically-based hot carrier simulation was used to und
erstand the importance of CHannel Initiated Secondary ELectron (CHISEL) inj
ection in scaled MOSFETs, and how it was used to develop a powerful CHISEL-
based technique for low voltage flash programming. Furthermore, it is shown
how CHISEL flash addresses many of the disadvantages of CHE programming te
chniques, making it an ideal candidate for low-voltage, low-power Gigabit f
lash memories.