Micro-structure transformation of silicon: A newly developed transformation technology for patterning silicon surfaces using the surface migration ofsilicon atoms by hydrogen annealing

The micro-structure transformation of silicon (MSTS), which is a transforma tion technology for patterning silicon surfaces by hydrogen annealing, is p resented for the first time. The transformation was controlled by the param eters of annealing pressure as well as annealing time and temperature. Void s of sub-micrometer regime size can be intentionally formed in the silicon substrates by making use of transformation. Electrical characteristics, suc h as the reliability of the thin dielectrics formed in the deep trenches, w ere improved with the aid of the MSTS process, due to the flattening of the inside surface of the trenches and the rounding of the corners. The mechan ism of the transformation by MSTS was studied by means of molecular dynamic s, which clearly shows the migration of silicon atoms on the surface. MSTS is a promising technology for the fabrication of future integrated circuits in silicon.