We have developed a phenomenological theory of growth behavior in semicondu
ctor heteroepitaxy that includes the effects of the formation of Stranski-K
rastanov (SK) islands and misfit-dislocations (MDs). Our theory can reprodu
ce the various types of growth behavior observed in hereroepitaxial growth.
Moreover, we also formulate a procedure for determining the phenomenologic
al parameters that includes atomistic calculations. The critical thickness
of InAs/GaAs(110) obtained by this procedure is in good agreement with the
experimentally obtained value.