Aggregate formation under homogeneous silane thermal decomposition

Citation
Aa. Onischuk et al., Aggregate formation under homogeneous silane thermal decomposition, J AEROS SCI, 31(11), 2000, pp. 1263-1281
Citations number
66
Categorie Soggetti
Chemical Engineering
Journal title
JOURNAL OF AEROSOL SCIENCE
ISSN journal
00218502 → ACNP
Volume
31
Issue
11
Year of publication
2000
Pages
1263 - 1281
Database
ISI
SICI code
0021-8502(200011)31:11<1263:AFUHST>2.0.ZU;2-Q
Abstract
A complete model of aerosol particle formation by thermal decomposition of silane is presented, which includes all steps from aerosol precursor format ion in the homogeneous reactions to particle coagulation. The model predict s silane conversion, concentrations of gaseous intermediates (disilane, tri silane, and others), size and concentration of aerosol particles, chemical composition of aerosol particles (number of SiH and SiH2 groups in the part icles). Additionally, we report measurements of aggregate fractal dimension s on the basis of electron microscopy micrographs. These data are required to link the chemical kinetic steps of the model with predictions about the particle size. Calculated time dependencies of gaseous concentrations, part icle size and concentration, particle chemical composition are in reasonabl e agreement with the experimental data obtained in the present work as well as in our earlier papers (Onischuk et al., 1997a.b, 1998a). The numerical simulations showed that the relative contribution of vapor and clusters (co ntaining not more than 10 silicon atoms) to the late of particle growth is in the range of 20-30%. The contribution from the particles containing more than 10(6) silicon atoms is in the range 70-80%. (C) 2000 Elsevier Science Ltd. All rights reserved.