X-ray diffraction line broadening from thermally deposited gold films

Citation
Rw. Cheary et al., X-ray diffraction line broadening from thermally deposited gold films, J APPL CRYS, 33, 2000, pp. 1271-1283
Citations number
42
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF APPLIED CRYSTALLOGRAPHY
ISSN journal
00218898 → ACNP
Volume
33
Year of publication
2000
Part
5
Pages
1271 - 1283
Database
ISI
SICI code
0021-8898(20001001)33:<1271:XDLBFT>2.0.ZU;2-E
Abstract
Diffraction profiles were analysed from thermally deposited 111-oriented go ld films, ranging in thickness from 300 to 1900 Angstrom. The data were col lected using the high-resolution powder diffractometer on beamline BM16 at the European Synchrotron Research Facility (ESRF) set at a wavelength of 0. 3507 Angstrom. The profiles were measured under conventional symmetric thet a-2 theta reflection conditions and by asymmetric transmission diffraction to ensure that only crystallites oriented normal to the substrate contribut e to the diffraction. An analysis of the instrument profile shape of the di ffractometer was undertaken using the SRM 660 LaB6 line profile standard. A parallel study of the films using atomic force microscopy and transmission electron microscopy was also undertaken to provide information on the dime nsions of the crystallite columns in the films and the presence of dislocat ions. All the films displayed diffraction broadening arising from both crys tallite-size effects and dislocation-induced strain effects. Analysis of th e magnitude and anisotropy of the dislocation-induced broadening with hkl i ndicates that the dislocations have a mixed screw/edge character and tend t o form primarily on (111) slip planes parallel to the substrate at densitie s of similar to 10(15) to 10(16) m(-2).