Interactions between plasmas in ionized physical vapor deposition discharges

Ionized physical vapor deposition is of current interest for the thin film deposition of diffusion barriers and copper seed layers for interconnect me tallization. Experimental evidence of the interaction between the magnetron discharge and the inductively coupled plasma leading to lower plasma poten tials and direct current bias voltages than expected is presented. Such eff ects have major implications for radio frequency coil lifetimes, discharge uniformity, and simulations of such discharges. (C) 2000 American Vacuum So ciety.