Vacuum beam studies of photoresist etching kinetics

One factor limiting the development of reliable models of high density, low pressure oxide etch plasmas is the relatively poor understanding of the pl asma-photoresist surface interactions. In particular, the relatively high r ates of photoresist (PR) loss experienced in high density fluorocarbon plas mas is a significant problem. It has long been accepted that fluorine plays a key role in controlling the oxide to PR etch rate selectivity. The addit ion of hydrogen has been shown to improve this selectivity, presumably by s cavenging fluorine from the tool by forming HF. By reducing the fluorine to carbon ratio in the plasma and more specifically at the PR surface itself, the rate of polymer deposition increases causing the net PR etch rate to d ecrease. In this work, the complex surface chemistry of fluorocarbon plasma s is simplified to facilitate the study of the interaction of fluorine atom s and hydrogen atoms on the PR surface. This chemistry is modeled in vacuum beam experiments with argon ions and independent fluxes of neutral deuteri um and fluorine atoms intersecting at the surface of photoresist samples. W e present experimental evidence that the etch yield of photoresist (carbon atoms removed per incident argon ion) under these conditions is high compar ed to that of silicon and silicon dioxide. The presence of a simultaneous f lux of deuterium atoms on the photoresist surface does not affect the etch yield despite the fact that DF is formed during the etching process. (C) 20 00 American Vacuum Society. [S0734-2101(00)06405-8].