A novel three-dimensional (3D) ballistic deposition simulator 3D-FILMS has
been developed for the modeling of thin film deposition and structure. The
simulator features a ballistic transport algorithm to model incident specie
s with angular distributions appropriate to physical vapor deposition syste
ms. Two-tiered data structuring is employed in order to enable the simulato
r to run using memory resources available to workstations. The simulator ha
s been applied to a unique class of thin films grown by the technique of gl
ancing angle deposition (GLAD). These films exhibit low bulk density due to
an internal structure consisting of isolated microcolumns, which can be en
gineered into a variety of 3D forms. Because of their inherent 3D morpholog
y, created by a combination of complex substrate motion and 3D shadowing, G
LAD films represent an ideal test subject for 3D simulation. Scanning elect
ron microscope images of films are presented together with simulation resul
ts, which correctly reproduce aspects of column morphology, column growth c
ompetition and extinction, and film bulk density. (C) 2000 American Vacuum
Society. [S0734-2101(00)03805-7].