Three-dimensional simulation of film microstructure produced by glancing angle deposition

Citation
T. Smy et al., Three-dimensional simulation of film microstructure produced by glancing angle deposition, J VAC SCI A, 18(5), 2000, pp. 2507-2512
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
18
Issue
5
Year of publication
2000
Pages
2507 - 2512
Database
ISI
SICI code
0734-2101(200009/10)18:5<2507:TSOFMP>2.0.ZU;2-L
Abstract
A novel three-dimensional (3D) ballistic deposition simulator 3D-FILMS has been developed for the modeling of thin film deposition and structure. The simulator features a ballistic transport algorithm to model incident specie s with angular distributions appropriate to physical vapor deposition syste ms. Two-tiered data structuring is employed in order to enable the simulato r to run using memory resources available to workstations. The simulator ha s been applied to a unique class of thin films grown by the technique of gl ancing angle deposition (GLAD). These films exhibit low bulk density due to an internal structure consisting of isolated microcolumns, which can be en gineered into a variety of 3D forms. Because of their inherent 3D morpholog y, created by a combination of complex substrate motion and 3D shadowing, G LAD films represent an ideal test subject for 3D simulation. Scanning elect ron microscope images of films are presented together with simulation resul ts, which correctly reproduce aspects of column morphology, column growth c ompetition and extinction, and film bulk density. (C) 2000 American Vacuum Society. [S0734-2101(00)03805-7].