Barium titanate microstructures with minimum feature sizes of 2.5 mu m are
fabricated on silicon substrates coated with platinum by a combination of h
ydrothermal growth and lift-off. Polycrystalline, cubic barium titanate is
grown at a temperature of 80 degrees C. Microstructures are obtained by pos
itive and negative patterning processes, where the former leads to the bett
er lift-off results due to the thicker resist layer. The minimum feature si
ze of 2.5 mu m refers to the minimum line width and separation between stru
ctures. It is limited by the optical lithography used in this work. The res
olution of the pattern edges is estimated to be approximately 80 nm and wou
ld allow the fabrication of even smaller patterns. Additionally, it is show
n that the use of electrochemistry for growth of thin barium titanate films
is compatible with lift-off and leads to similar pattern definition. (C) 2
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