Several Scanning Probe Microscopy (SPM) techniques are currently under deve
lopment for 2D dopant profiling; among these the Scanning Capacitance Micro
scopy (SCM). The signal-to-noise. ratio in SCM measurements is a critical i
ssue, due to the small tip-to-semiconductor differential capacitance (typic
ally in the attoFarad range). Many factors may have a negative influence on
the reproducibility of SCM data and must be kept under control: sample-rel
ated problems, tip-related problems, and problems related to the electrical
operating conditions. Furthermore, the conversion of the SCM experimental
data into a quantitative 2D map of the local dopant concentration requires
a huge effort in terms of reverse simulation. In this paper, the current pr
ocedures for preparing SCM samples are briefly reviewed. Then, the sample p
reparation and the experimental dC/dV curve of a calibrated staircase struc
ture are presented. Finally, the experimental SCM data (the dC/dV and the c
onversion curves) are compared with the theoretical data simulated with a d
evice simulator. (C) 2000 Elsevier; Science Ltd. All rights reserved.