MOS transistor reliability under analog operation

Citation
R. Thewes et al., MOS transistor reliability under analog operation, MICROEL REL, 40(8-10), 2000, pp. 1545-1554
Citations number
43
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
40
Issue
8-10
Year of publication
2000
Pages
1545 - 1554
Database
ISI
SICI code
0026-2714(200008/10)40:8-10<1545:MTRUAO>2.0.ZU;2-M
Abstract
Reliability evaluation for MOS transistors under analog operation requires different or specifically adapted approaches compared to the ones known fro m the digital world. Focussing on the particular analog operating condition s and the related lifetime criteria, a comprehensive discussion is performe d of MOSFET reliability taking into account channel hot-carrier stress, bia s temperature instabilities, and oxide wear-out. The conditions for the occ urrence of these mechanisms and criteria for stress induced malfunction of analog circuits are discussed and the physics behind the behavior of typica l analog device parameters after stress are addressed. Furthermore, specifi c aspects concerning the definition of analog lifetime criteria and strateg ies to guarantee reliability by means of circuit design are considered. (C) 2000 Elsevier Science Ltd. All rights reserved.