Recombination of self-trapped excitons in silicon nanocrystals grown in silicon oxide

Citation
Ks. Zhuravlev et Ay. Kobitsky, Recombination of self-trapped excitons in silicon nanocrystals grown in silicon oxide, SEMICONDUCT, 34(10), 2000, pp. 1203-1206
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
34
Issue
10
Year of publication
2000
Pages
1203 - 1206
Database
ISI
SICI code
1063-7826(2000)34:10<1203:ROSEIS>2.0.ZU;2-7
Abstract
The kinetics of photoluminescence (PL) and steady-state PL from silicon nan ocrystals formed in the SiO2 matrix by silicon ion implantation were studie d experimentally for the first time in the temperature range from liquid-he lium to room temperature. A dramatic increase in the photoluminescence deca y time, accompanied by PL intensity quenching, is observed below 70 K. The results obtained indicate that the silicon nanocrystal PL arises from radia tive recombination of excitons self-trapped at the silicon nanocrystal-SiO2 interface. (C) 2000 MAIK "Nauka/ Interperiodica".