Citation
Sh. Cheng et al., Effects of deposition temperature on electrical properties of hydrogenatedamorphous carbon films, ACT PHY C E, 49(10), 2000, pp. 2041-2046
Citations number
11
Categorie Soggetti
Physics
Journal title
ACTA PHYSICA SINICA
ISSN journal
10003290
→ ACNP
Volume
49
Issue
10
Year of publication
2000
Pages
2041 - 2046
Database
ISI
SICI code
1000-3290(200010)49:10<2041:EODTOE>2.0.ZU;2-O
Abstract
Hydrogenated amorphous carbon films were deposited using ECR plasma with be
nzene as carbon source at varying substrate temperature. The effects of dep
osition temperature on the resistivity and the intensity of electric break
down have been investigated. The results show these properties depend on th
eir growth conditions. The experiment results are further investigated usin
g Raman spectra analysis.