Erasure effect of the reading beam on the decay process of chi((2)) in all-optical poling

Citation
X. Liu et al., Erasure effect of the reading beam on the decay process of chi((2)) in all-optical poling, APP PHYS B, 71(4), 2000, pp. 539-543
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS B-LASERS AND OPTICS
ISSN journal
09462171 → ACNP
Volume
71
Issue
4
Year of publication
2000
Pages
539 - 543
Database
ISI
SICI code
0946-2171(200010)71:4<539:EEOTRB>2.0.ZU;2-4
Abstract
We have studied the effect of the reading beam on the decay process of the photoinduced second-order susceptibility chi((2)) in both the guest-host sy stem (disperse red I-doped polymethyl methactrylate) and the side-chain sys tem (disperse red 19-functionalized polyimide polymer). Both experimentally and theoretically, we have proved that the reading beam has the erasure ef fect on the decay process, that is, chi((2)) decays faster in the high inte nsity than in the low intensity of the reading be:un. Furthermore, the rela tionship between the time constant re of the slow component of the decay pr ocess and the intensity of the reading beam I-1.06 is derived from the theo retical equations, which is fitted well with the experimental results. Base d on the fitting parameters, we also compare, quantitatively, the thermal-i nduced orientational diffusion of trans- and the quantum efficiency of tran s-to-cis photoisomerization in the two systems.