Solid-liquid interface velocity and diffusivity in laser-melt amorphous silicon

Citation
L. Brambilla et al., Solid-liquid interface velocity and diffusivity in laser-melt amorphous silicon, APPL PHYS L, 77(15), 2000, pp. 2337-2339
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
15
Year of publication
2000
Pages
2337 - 2339
Database
ISI
SICI code
0003-6951(20001009)77:15<2337:SIVADI>2.0.ZU;2-Z
Abstract
We studied the microscopic kinetics of the amorphous-liquid interface in su percooled laser-melt silicon by means of molecular dynamics computer simula tions. The interface velocity was obtained as a function of temperature by direct simulation of the interface motion in an amorphous-liquid model syst em. The temperature dependence of the kinetic prefactor was extracted from the interface velocity function and compared to the values of self-diffusiv ity obtained from independent molecular dynamics simulations of bulk amorph ous Si. The kinetic prefactor for interfacial diffusion shows a distinctly non-Arrhenius behavior which is attributed to Fulcher-Vogel kinetics in the supercooled liquid. (C) 2000 American Institute of Physics. [S0003- 6951(0 0)04641-6].