Ultraviolet lithography of self-assembled monolayers for submicron patterned deposition

We report on a lithographic technique that uses self-assembled monolayers ( SAMs) as a resist to fabricate patterned, chemically functionalized surface s. Large area line, square, and triangular patterns with a periodicity of 5 32 nm were generated exposing SAMs of hydrophobic or hydrophilic alkanethio lates to an ultraviolet laser interference pattern at 193 nm for only a few minutes (corresponding to similar to 16 J/cm(2)) followed by the immersion into an alternating thiol. Patterned films of CaCO3, Zn(OH)(2), and polyme rs were directly deposited on these templates. Using substrates patterned w ith oppositely charged SAMs, large periodic arrays of charged colloids were fabricated. (C) 2000 American Institute of Physics. [S0003-6951(00)01041-X ].