Hardness and stress of amorphous carbon films deposited by glow discharge and ion beam assisting deposition

Citation
Fc. Marques et Rg. Lacerda, Hardness and stress of amorphous carbon films deposited by glow discharge and ion beam assisting deposition, BRAZ J PHYS, 30(3), 2000, pp. 527-532
Citations number
24
Categorie Soggetti
Physics
Journal title
BRAZILIAN JOURNAL OF PHYSICS
ISSN journal
01039733 → ACNP
Volume
30
Issue
3
Year of publication
2000
Pages
527 - 532
Database
ISI
SICI code
0103-9733(200009)30:3<527:HASOAC>2.0.ZU;2-E
Abstract
The hardness and stress of amorphous carbon films prepared by glow discharg e and by ion beam assisting deposition are investigated. Relatively hard an d almost stress free amorphous carbon films were deposited by the glow disc harge technique. On the other hand, by using the ion beam assisting deposit ion, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicat es that all films are composed of a sp(2)-rich network. These results contr adict the currently accepted concept that both stress and hardness are only related to the concentration Of sp(3) sites. Furthermore, the same results also indicate that the sp(2) sites may also contribute to the hardness of the films.