A new technology for chemical vapor deposition reactors. Part One: Presentation and analysis of experimental results

This paper presents a new technology for CVD reactors, developed in order t o solve several practical problems which limit the efficiency of thin films manufactured in the microelectronic industry. This technology can be scale d down into a perfectly representative small scale pilot plant, very useful for a more rational development of new industrial applications. The first part of the article deals with a description of the equipment, presentation and analysis of a series of experimental results. Four different deposits, of increasing complexity, have been selected for a detailed comparison bet ween the new technology presented here and the classical equipment used in the microelectronic industry.