A method for modeling the variations in MOSFET performance systematically i
s proposed in this paper. A characteristic of this method is that the relat
ionships between the model parameters and a small number of physical quanti
ties governing MOSFET performance are analyzed statistically using intermed
iate models. The variations of individual physical quantities are summarize
d in a form called an intermediate statistical model. Necessary and suffici
ent specific statistical information is reflected by the intermediate stati
stical model. A designer can perform transformations of intermediate statis
tical models to be incorporated into a MOSFET model desired. Characteristic
s of an intermediate statistical model can be accurately reflected with res
pect to many models currently in use. In addition, worst-case parameters ca
n be easily extracted. Variations of a 0.3-mu m CMOS process are modeled ex
perimentally as an example to verify the efficacy of this method. (C) 2000
Scripta Technica.