Influence of bias potential on the optical properties of Nb2O5 films obtained by magnetron sputtering

Authors
Vol'pyan, OD Obod, YA Yakovlev, PP Meshkov, BB
Citation
Od. Vol'Pyan et al., Influence of bias potential on the optical properties of Nb2O5 films obtained by magnetron sputtering, J OPT TECH, 67(10), 2000, pp. 889-891
Citations number
9
Categorie Soggetti
Optics & Acoustics
Journal title
JOURNAL OF OPTICAL TECHNOLOGY
ISSN journal
10709762 → ACNP
Volume
67
Issue
10
Year of publication
2000
Pages
889 - 891
Database
ISI
SICI code
1070-9762(200010)67:10<889:IOBPOT>2.0.ZU;2-2
Abstract
The optical properties of Nb2O5 films obtained by de reactive magnetron spu ttering of Nb targets are investigated. The parameters of the technical pro cess yielding films with a uniform refractive index over the thickness are described. A procedure for calculating the dispersion of the refractive ind ex and absorption coefficient of optical films is described. The influence of the bias potential applied to a supplementary anode of the sputtering sy stem on the optical constants and growth rate of Nb2O5 films is investigate d. (C) 2000 The Optical Society of America. [S1070-9762(00)00910-5].