CU ADSORPTION ON CO FILMS - EDGE DECORATION VERSUS INTERMIXING

Citation
R. Allenspach et al., CU ADSORPTION ON CO FILMS - EDGE DECORATION VERSUS INTERMIXING, Surface science, 381(1), 1997, pp. 573-580
Citations number
25
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
381
Issue
1
Year of publication
1997
Pages
573 - 580
Database
ISI
SICI code
0039-6028(1997)381:1<573:CAOCF->2.0.ZU;2-L
Abstract
Heteroepitaxial growth of the Co-Cu system is investigated by scanning tunneling microscopy. Cu deposited on Co/Cu(001) decorates the step e dges of Co islands and forms nanometer-sized rings. Subsequent deposit ion of Co transforms the film morphology from compact to heterogeneous ly intermixed. We relate this growth asymmetry to the largely differen t surface free energies of Co and Cu, which impose a diffusion barrier at Co-Cu boundaries, and to atomic exchange processes that occur in t he presence of Co adatom gas. (C) 1997 Elsevier Science B.V.