Designing high-performance vacuum control systems

In commercial and research applications, thin-film systems are used to perf orm various processes at different vacuum levels. All of these thin-film sy stems use some type of vacuum control method to maintain the process chambe r at a specific vacuum level during the process. Since most thin-film proce sses change their rate and effectiveness as a function of the vacuum level, it Is important to maintain and control those process pressures to ensure consistent, predictable results. In semiconductor and thin-film transistor display manufacturing tools, there are frequently multiple chambers on each tool that perform different functions, and each chamber uses a separate pr essure control system.