CxFy polymer film deposition in DC and RF fluorinert vapor plasmas

Polymer films containing CxFy have been deposited in Fluorinert vapor (C7F1 6) plasmas. The spatial and temporal evolution of optical emission of CF2 a nd C-2 radicals was monitored and kinetics of the C7F16 decomposition proce ss was discussed. The films were deposited on stainless steel, glass, molyb denum and silicon wafers at room temperature with the vapor pressures, 40 a nd 100 Pa. Electrical properties such as the breakdown voltage and dielectr ic constant as well as the structure of the films were analyzed. The compos ition and characteristics of the films were determined by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy techniques, sca nning electron microscopy and electron spin resonance spectroscopy. (C) 200 0 Elsevier Science Ltd. All rights reserved.