Formation and physical properties of Al base alloys by sputtering

TL-AI and Ti-Si alloys were prepared by RF sputtering in a low-pressure arg on atmosphere. The microhardness and thermal stability of these alloys were investigated in relation to the structure of alloys. In Al-Ti system, an a morphous phase and AlTi3 were formed in the composition range of 35-60 at%T i and 60-80.5 at%Ti, respectively. In Al-Si system, an amorphous phase was formed for Si content of 45 at% or more. Although the microhardeness of AL- Ti alloys shows a maximum at 50 at%Ti, its value for AI-Si alloys rises wit h increasing Si content. These results suggest that the atomic bonding char acter is different in both alloys, and the covalent character becomes stron ger for Si rich AI-Si alloys. (C) 2000 Elsevier Science Ltd. All tights res erved.