Faceted inversion domain boundary in GaN films doped with Mg

Citation
Lt. Romano et al., Faceted inversion domain boundary in GaN films doped with Mg, APPL PHYS L, 77(16), 2000, pp. 2479-2481
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
16
Year of publication
2000
Pages
2479 - 2481
Database
ISI
SICI code
0003-6951(20001016)77:16<2479:FIDBIG>2.0.ZU;2-H
Abstract
Homoepitaxial GaN films, doped with Mg, were grown by rf-plasma molecular-b eam epitaxy on Ga-polarity (0001) templates. Convergent-beam electron diffr action analysis establishes that the film polarity changes from [0001] to [ 000 (1) under bar] when the Mg flux during growth is approximately 1 ML/s. Secondary ion mass spectrometry indicates a doping concentration of similar to 10(20) cm(-3) in the film where the inversion occurs, and a reduced Mg incorporation in the [000 (1) under bar] material. Transmission electron mi croscopy shows that the inversion domain boundary is faceted predominantly along the {0001} and {h,h,-2h,l} planes, with l/h approximately equal to 3. Using first-principles total energy calculations, we show that the {h,h,-2 h,l} segments of the boundary are stabilized by the incorporation of Mg in threefold coordinated lattice sites. (C) 2000 American Institute of Physics . [S0003- 6951(00)03042-4].