The use of aluminum and gallium hydrides in materials science

Citation
Ja. Jegier et Wl. Gladfelter, The use of aluminum and gallium hydrides in materials science, COORD CH RE, 206, 2000, pp. 631-650
Citations number
105
Categorie Soggetti
Inorganic & Nuclear Chemistry
Journal title
COORDINATION CHEMISTRY REVIEWS
ISSN journal
00108545 → ACNP
Volume
206
Year of publication
2000
Pages
631 - 650
Database
ISI
SICI code
0010-8545(200009)206:<631:TUOAAG>2.0.ZU;2-C
Abstract
The use of aluminum and gallium hydrides as molecular precursors has been a n important development in the field of materials science. Alanes and galla nes have been used in a variety of techniques, such as chemical vapor depos ition and solution-based methodologies, to synthesize materials ranging fro m aluminum thin films to nanocrystalline 13-15 materials. This review is in tended to capture the general features of the use of alanes and gallanes in the synthesis of solid state materials. (C) 2000 Elsevier Science S.A. All rights reserved.