Uniformity of semi-insulating InP wafers obtained by Fe diffusion

Citation
R. Fornari et al., Uniformity of semi-insulating InP wafers obtained by Fe diffusion, J APPL PHYS, 88(9), 2000, pp. 5225-5229
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
9
Year of publication
2000
Pages
5225 - 5229
Database
ISI
SICI code
0021-8979(20001101)88:9<5225:UOSIWO>2.0.ZU;2-8
Abstract
As-cut semiconducting InP wafers were submitted to Fe diffusion at high tem perature. The subsequent electrical characterization showed that the wafers became semi-insulating, with resistivities well above 10(7) Omega cm and m obilities in the range of 3000-4000 cm(2)/V s. In this article a study on t he uniformity of Fe-diffused semi-insulating InP wafers is presented. The p hotoconductivity, photoluminescence and resistivity mapping showed that the short range uniformity is improved with respect to typical as-grown Fe-dop ed InP. However, sometimes the wafers exhibit long range gradients of resis tivity and luminescence intensity which are believed to be associated to te mperature gradients inside the annealing furnace. (C) 2000 American Institu te of Physics. [S0021-8979(00)02922-4].