Lv. Dao et al., A comparison of impurity-free and ion-implantation-induced intermixing of InGaAs/InP quantum wells, J APPL PHYS, 88(9), 2000, pp. 5252-5254
We have compared the time integrated photoluminescence (PL) and the time re
solved PL of several lattice matched InGaAs/InP quantum wells intermixed ei
ther by ion implantation or an impurity-free method. We have found that the
carrier capture rates into quantum wells and carrier relaxation from the w
ells depend on the type of intermixing used. Our results indicate that the
carrier lifetimes are significantly longer in samples intermixed by the imp
urity-free methods, while the carrier collection efficiency of the quantum
wells is more efficient in samples intermixed by ion implantation. (C) 2000
American Institute of Physics. [S0021-8979(00)02322-7].