In situ and ex situ characterization of thin films by soft X-ray emission spectroscopy

Citation
Jh. Guo et al., In situ and ex situ characterization of thin films by soft X-ray emission spectroscopy, J ELEC SPEC, 110(1-3), 2000, pp. 41-67
Citations number
83
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
ISSN journal
03682048 → ACNP
Volume
110
Issue
1-3
Year of publication
2000
Pages
41 - 67
Database
ISI
SICI code
0368-2048(200010)110:1-3<41:ISAESC>2.0.ZU;2-6
Abstract
Soft X-ray emission spectroscopy has been used as a chemical probe in the c haracterization of thin film materials. Some examples of soft X-ray emissio n studies are presented to show the chemical sensitivity, site selectivity and depth dependence of this method. The substantial penetration of soft X- rays offers true bulk probing and facilitates studies of interfaces and bur ied structures. By choosing the proper geometry soft X-ray emission spectro scopy provides a non-destructive chemical analysis of sandwich structures. This technique has also been used to enable in situ and real-time character ization of thin films during vapor deposition growth. (C) 2000 Elsevier Sci ence BN. All rights reserved.