TRANSPORT AND DEPOSITION PROCESSES OF SPUTTERED PARTICLES IN RF-MICROWAVE HYBRID SPUTTERING DISCHARGES

Transport and deposition processes of sputtered particles from a (Ba, Sr)TiO3 target have been investigated in rf-microwave hybrid discharge s with Ar/O-2. Deposition experiments were made over the gas pressure range of 0.5-10 mTorr using trenched substrates. Moreover, numerical s imulations were carried out to reveal the effects of gas-phase scatter ing and surface re-emission of particles on their trajectories and the resulting deposition profiles in trenches. In the experiments, the st ep coverages of narrower trenches with aspect ratios above unity were found to be improved with decreasing pressure; such deposition behavio r was predicted by the simulations, and was ascribed to the higher dir ectionality of depositing fluxes onto the substrate at lower pressures .