Relations between the concentrations of neutral (N-0) and charged (N+) sing
le-substitutional nitrogen and of nitrogen-vacancy (N-V) complexes in chemi
cal vapour deposited diamond films of approximate to 0.2 mm thickness with
nitrogen impurity concentration levels of 10 ppm are studied. For this purp
ose the films were subjected to 8 MeV electron irradiation at room temperat
ure and subsequent annealing at 800 degrees C. The samples were analysed by
micro-photoluminescence; visible and IR absorption, and Electron Spin Reso
nance techniques. It was found that the concentration of nitrogen in the (N
-V) and N+ forms, in as-grown films, is less than 0.1% and 10% of the neutr
al substitutional nitrogen N-0, respectively.