Kinetics of two-dimensional electrons and holes in tunneling silicon MOS structures

Citation
Pd. Altukhov et Eg. Kuzminov, Kinetics of two-dimensional electrons and holes in tunneling silicon MOS structures, PHYS ST S-B, 221(1), 2000, pp. 439-445
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
ISSN journal
03701972 → ACNP
Volume
221
Issue
1
Year of publication
2000
Pages
439 - 445
Database
ISI
SICI code
0370-1972(200009)221:1<439:KOTEAH>2.0.ZU;2-R
Abstract
A recombination radiation line (S-line) of surface 2D holes and 2D nonequil ibrium electrons is observed in electroluminescence spectra of tunneling [1 00] silicon MOS (metal-oxide-semiconductor) diodes under tunneling injectio n of electrons into a self organized electron quantum well. The electron qu antum well in presence of an electrical field in the substrate forms an add itional potential barrier. The transparency of a double barrier, including the oxide barrier and the additional barrier, can be modulated by the elect rical field in the substrate. A possible realization of a tunneling ballist ic transistor (tullistor) by use of this modulation is discussed. The tulli stor can serve as a fast and effective light emitter or a laser and as a fa st photodetector. A simple theory of the tullistor is given. Kinetics of 2D electrons and holes and corresponding kinetics of electroluminescence are analyzed.