Electromigration of vacancies in copper

Citation
J. Hoekstra et al., Electromigration of vacancies in copper, PHYS REV B, 62(13), 2000, pp. 8568-8571
Citations number
37
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
01631829 → ACNP
Volume
62
Issue
13
Year of publication
2000
Pages
8568 - 8571
Database
ISI
SICI code
0163-1829(20001001)62:13<8568:EOVIC>2.0.ZU;2-Q
Abstract
The total current-induced force on atoms in a Cu wire containing a vacancy are calculated using the self consistent one-electron density matrix in the presence of an electric current, without separation into electron-wind and direct forces. By integrating the total current-induced force, the change in vacancy migration energy due to the current is calculated. We use the ch ange in migration energy with current to infer an effective electromigratio n driving force F-e. Finally, we calculate the proportionality constant rho * between F-e and the current density in the wire.