A new method of layer deposition

Citation
Sg. Psakh'E et al., A new method of layer deposition, TECH PHYS L, 26(10), 2000, pp. 851-853
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS LETTERS
ISSN journal
10637850 → ACNP
Volume
26
Issue
10
Year of publication
2000
Pages
851 - 853
Database
ISI
SICI code
1063-7850(2000)26:10<851:ANMOLD>2.0.ZU;2-F
Abstract
A new approach to layer-by-layer film deposition is developed based on the data of molecular dynamics modeling. The proposed deposition method makes u se of a nonlinear pulse interaction with a free material (source) surface. It is shown that, provided the pulse amplitude is sufficiently large, an at omic plane is detached from the surface. Impinging on a target (substrate), the detached plane forms a monolayer coating. Combining various source mat erials, it is possible to obtain multilayer films with complicated composit ions and structures. (C) 2000 MAIK "Nauka / Interperiodica".