INTERFACE VIBRATIONAL-SPECTRUM INVESTIGATION ON REACTIVELY-SPUTTERED A-SI-H A-GE-H MULTILAYER FILMS/

Authors
Citation
Yy. Wang et Hz. Xu, INTERFACE VIBRATIONAL-SPECTRUM INVESTIGATION ON REACTIVELY-SPUTTERED A-SI-H A-GE-H MULTILAYER FILMS/, Thin solid films, 299(1-2), 1997, pp. 10-13
Citations number
9
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
299
Issue
1-2
Year of publication
1997
Pages
10 - 13
Database
ISI
SICI code
0040-6090(1997)299:1-2<10:IVIORA>2.0.ZU;2-D
Abstract
In this paper, the interface vibrational spectrum in a reactive-sputte ring a-Si:H/a-Ge:H muitilayer was investigated using IR transmission a nd Raman scattering. It is shown that excess deformation is not found near the interface and there is no evidence for excess hydrogen at the a-Si:H/a-Ge:H interface. The thermal stability of a-Si:H/a-Ge:H multi layer films was also studied by using IR and X-ray diffraction spectra . It was found that the crystallization temperature of a multilayer wi th small layer thickness is higher than that of bulk a-Ge:H. (C) 1997 Elsevier Science S.A.